Search Results for: Advanced Resist Materials For Next Generation Lithography

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist material

This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the

Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This b

Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were