Development of III-V P-MOSFETs with High-kappa Gate Stack for Future CMOS Applications

Development of III-V P-MOSFETs with High-kappa Gate Stack for Future CMOS Applications
Author :
Publisher :
Total Pages : 167
Release :
ISBN-10 : OCLC:862932644
ISBN-13 :
Rating : 4/5 (44 Downloads)

Book Synopsis Development of III-V P-MOSFETs with High-kappa Gate Stack for Future CMOS Applications by : Padmaja Nagaiah

Download or read book Development of III-V P-MOSFETs with High-kappa Gate Stack for Future CMOS Applications written by Padmaja Nagaiah and published by . This book was released on 2012 with total page 167 pages. Available in PDF, EPUB and Kindle. Book excerpt:


Development of III-V P-MOSFETs with High-kappa Gate Stack for Future CMOS Applications Related Books

Development of III-V P-MOSFETs with High-kappa Gate Stack for Future CMOS Applications
Language: en
Pages: 167
Authors: Padmaja Nagaiah
Categories: Metal oxide semiconductor field-effect transistors
Type: BOOK - Published: 2012 - Publisher:

DOWNLOAD EBOOK

Interface-engineered Ge MOSFETs for Future High Performance CMOS Applications
Language: en
Pages: 159
Authors: Duygu Kuzum
Categories:
Type: BOOK - Published: 2009 - Publisher: Stanford University

DOWNLOAD EBOOK

As the semiconductor industry approaches the limits of traditional silicon CMOS scaling, introduction of performance boosters like novel materials and innovativ
Reliability of High Mobility SiGe Channel MOSFETs for Future CMOS Applications
Language: en
Pages: 203
Authors: Jacopo Franco
Categories: Technology & Engineering
Type: BOOK - Published: 2013-10-19 - Publisher: Springer Science & Business Media

DOWNLOAD EBOOK

Due to the ever increasing electric fields in scaled CMOS devices, reliability is becoming a showstopper for further scaled technology nodes. Although several g
A Study of Electrical and Material Characteristics of III-V MOSFETs and TFETs with High-[kappa] Gate Dielectrics
Language: en
Pages: 244
Authors: Han Zhao
Categories:
Type: BOOK - Published: 2010 - Publisher:

DOWNLOAD EBOOK

The performance and power scaling of metal-oxide-semiconductor field-effect-transistors (MOSFETs) has been historically achieved through shrinking the gate leng
Characterization, integration and reliability of HfO2 and LaLuO3 high-κ/metal gate stacks for CMOS applications
Language: en
Pages: 199
Authors: Alexander Nichau
Categories:
Type: BOOK - Published: 2014-04-03 - Publisher: Forschungszentrum Jülich

DOWNLOAD EBOOK